Li, Jarvis

Book Chapter from CaltechAUTHORS

• Lewis, Scott M. and DeRose, Guy A., et el. (2018) Design and implementation of the next generation electron beam resists for the production of EUVL photomasks; ISBN 9781510622159; Photomask Technology 2018; Art. No. 108100N; 10.1117/12.2501808