[
    {
        "id": "authors:92w3j-g5k94",
        "collection": "authors",
        "collection_id": "92w3j-g5k94",
        "cite_using_url": "https://resolver.caltech.edu/CaltechCSTR:1995.cs-tr-95-12",
        "type": "monograph",
        "title": "Concurrent Simulations of Plasma Reactors for VLSI Manufacturing",
        "author": [
            {
                "family_name": "Rieffel",
                "given_name": "Marc A.",
                "clpid": "Rieffel-M-A"
            }
        ],
        "abstract": "Recent advances in microprocessor performance have been driven primarily by improvements in manufacturing technology. New processes and equipment have paved the way for smaller feature sizes and larger die sizes. These in tum have enabled the production of microprocessors with more transistors, operating at lower voltages and higher clock rates. One of the key pieces of equipment in microelectronics manufacturing is the plasma reactor, used in 30 to 40 percent of the processing steps. These reactors use plasmas, or energetic rarefied gases, to remove particles from, and deposit particles on, silicon wafers. Improving the design of these reactors, and\nthe processes that they are used for, will enable the microelectronics industry to make smaller, cheaper, and faster microprocessors.",
        "doi": "10.7907/Z92805N5",
        "publisher": "California Institute of Technology",
        "publication_date": "1995-01-01"
    }
]