@article{https://resolver.caltech.edu/CaltechAUTHORS:20110603-150618670,
    title = "Emission factors for open and domestic biomass burning for use in atmospheric models",
    journal = "Atmospheric Chemistry and Physics",
    year = "2011",
    url = "https://resolver.caltech.edu/CaltechAUTHORS:20110603-150618670",
    id = "record",
    issn = "1680-7316",
    doi = "10.5194/acp-11-4039-2011",
    volume = "11"
}


@article{https://resolver.caltech.edu/CaltechAUTHORS:REIjap96,
    title = "Amorphous (Mo, Ta, or W)–Si–N diffusion barriers for Al metallizations",
    journal = "Journal of Applied Physics",
    year = "1996",
    url = "https://resolver.caltech.edu/CaltechAUTHORS:REIjap96",
    id = "record",
    issn = "0021-8979",
    doi = "10.1063/1.360909",
    volume = "79"
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@article{https://resolver.caltech.edu/CaltechAUTHORS:20120216-095821404,
    title = "Method for fabricating a low stress x-ray mask using annealable amorphous refractory compounds",
    journal = "Journal of Vacuum Science and Technology B",
    year = "1995",
    url = "https://resolver.caltech.edu/CaltechAUTHORS:20120216-095821404",
    id = "record",
    issn = "1071-1023",
    doi = "10.1116/1.588331",
    volume = "13"
}


@article{https://resolver.caltech.edu/CaltechAUTHORS:20120306-151931971,
    title = "Reactive ion etching of Ta–Si–N diffusion barriers in CF\_(4)+O\_(2)",
    journal = "Journal of Vacuum Science and Technology B",
    year = "1994",
    url = "https://resolver.caltech.edu/CaltechAUTHORS:20120306-151931971",
    id = "record",
    issn = "1071-1023",
    doi = "10.1116/1.587763",
    volume = "12"
}


@article{https://resolver.caltech.edu/CaltechAUTHORS:POKjap91,
    title = "Thermal oxidation of amorphous ternary Ta36Si14N50 thin films",
    journal = "Journal of Applied Physics",
    year = "1991",
    url = "https://resolver.caltech.edu/CaltechAUTHORS:POKjap91",
    id = "record",
    issn = "0021-8979",
    doi = "10.1063/1.349345",
    volume = "70"
}


@article{https://resolver.caltech.edu/CaltechAUTHORS:KOLjap91,
    title = "Tantalum-based diffusion barriers in Si/Cu VLSI metallizations",
    journal = "Journal of Applied Physics",
    year = "1991",
    url = "https://resolver.caltech.edu/CaltechAUTHORS:KOLjap91",
    id = "record",
    issn = "0021-8979",
    doi = "10.1063/1.349594",
    volume = "70"
}