<h1>Li, Jarvis</h1>
<h2>Book Chapter from <a href="https://authors.library.caltech.edu">CaltechAUTHORS</a></h2>
<ul>
<li>Lewis, Scott M. and DeRose, Guy A., el al. (2018) <a href="https://resolver.caltech.edu/CaltechAUTHORS:20190117-111919486">Design and implementation of the next generation electron beam resists for the production of EUVL photomasks</a>; ISBN 9781510622159; Photomask Technology 2018; Art. No. 108100N; <a href="https://doi.org/10.1117/12.2501808">10.1117/12.2501808</a></li>
</ul>