@inbook{https://resolver.caltech.edu/CaltechAUTHORS:20190117-111919486,
    title = "Photomask Technology 2018",
    chapter = "Design and implementation of the next generation electron beam resists for the production of EUVL photomasks",
    year = "2018",
    url = "https://resolver.caltech.edu/CaltechAUTHORS:20190117-111919486",
    id = "record",
    isbn = "9781510622159",
    doi = "10.1117/12.2501808"
}