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scattering of water group ions on ice surfaces with relevance to
Saturn’s icy moons; Icarus; Vol. 379; Art. No. 114967; 10.1016/j.icarus.2022.114967
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Adaptable Device for Scalable Electrospinning of Low- and High-Viscosity
Solutions; Instruments; Vol. 3; No. 3; Art. No. 37; 10.3390/instruments3030037
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dioxygen evolution in collisions of carbon dioxide with surfaces;
Nature Communications; Vol. 10; Art. No. 2294; PMCID PMC6534623; 10.1038/s41467-019-10342-6
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nanofiber-based niflumic acid capsules with superior physicochemical
properties; Journal of Pharmaceutical and Biomedical Analysis; Vol.
166; 371-378; 10.1016/j.jpba.2019.01.037
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formation of nanoparticles on electrospun nanofibres; Nature
Communications; Vol. 9; Art. No. 4740; PMCID PMC6226441; 10.1038/s41467-018-07243-5
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to “On the origin of molecular oxygen in cometary comae”; Nature
Communications; Vol. 9; Art. No. 2581; PMCID PMC6030084; 10.1038/s41467-018-04943-w
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Fabrication of Supercapacitors by Nozzle-free Electrospinning; ACS
Applied Energy Materials; Vol. 1; No. 2; 296-300; 10.1021/acsaem.7b00227
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molecular oxygen production in cometary comae; Nature
Communications; Vol. 8; Art. No. 15298; PMCID PMC5424151; 10.1038/ncomms15298
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water-splitting reaction in single collisions of water ions with
surfaces; Chemical Science; Vol. 8; No. 4; 2852-2858; PMCID
PMC5427682; 10.1039/c6sc05065d
- Yao, Yunxi and Giapis, Konstantinos P. (2017) Dynamic
Deuterium Enrichment in Cometary Water Via ELEY–RIDEAL Reactions;
Astrophysical Journal; Vol. 835; No. 1; Art. No. 67; 10.3847/1538-4357/835/1/67
- Yao, Yunxi and Giapis, Konstantinos P. (2016) Dynamic
nitroxyl formation in the ammonia oxidation on platinum via Eley–Rideal
reactions; Physical Chemistry Chemical Physics; Vol. 18; No. 43;
29858-29863; 10.1039/C6CP06533C
- Yao, Yunxi and Giapis, Konstantinos P. (2016) Direct
Hydrogenation of Dinitrogen and Dioxygen via Eley-Rideal Reactions;
Angewandte Chemie International Edition; Vol. 55; No. 38; 11595-11599;
10.1002/anie.201604899
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of Eley-Rideal Reactions at Hyperthermal Energies; Physical Review
Letters; Vol. 116; No. 25; Art. No. 253202; 10.1103/PhysRevLett.116.253202
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Charge Transfer in Ion-Surface Collisions at Hyperthermal Energies;
ChemPhysChem; Vol. 17; No. 10; 1430-1434; 10.1002/cphc.201600045
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Resistance between Few-Layer Graphene and Water: Liquid Layering
Effects; Nano Letters; Vol. 15; No. 9; 5744-5749; 10.1021/acs.nanolett.5b03024
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Flow Ion Mobility Separation with Mass Spectrometric Detection Using a
Nano-Radial Differential Mobility Analyzer at Low Flow Rates;
Analytical Chemistry; Vol. 85; No. 9; 4335-4341; 10.1021/ac3032417
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nanotubes as electronic interconnects in solid acid fuel cell
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for and Mechanisms of Reduction in Thermal Conductivity in
Nanostructured Thermoelectrics; Journal of Heat Transfer; Vol. 134;
No. 10; Art. No. 102402; 10.1115/1.4006750
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conductivity reduction in core-shell nanowires; Physical Review B;
Vol. 84; No. 8; Art. No. 085442; 10.1103/PhysRevB.84.085442
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excimer emission from multicapillary discharges in direct current
mode; Physics of Plasmas; Vol. 18; No. 8; Art. No. 083506; 10.1063/1.3623738
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mixing during annealing of zinc oxide nanoparticle junctions;
Applied Physics Letters; Vol. 98; No. 21; Art. No. 211904; 10.1063/1.3593487
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Functions and Penetrations of Five Differential Mobility Analyzers for
Sub-2 nm Particle Classification; Aerosol Science and Technology;
Vol. 45; No. 4; 480-492; 10.1080/02786826.2010.546819
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Reduction of Thermal Conductivity in Si/Ge Core-Shell Nanowires;
Nano Letters; Vol. 11; No. 2; 618-623; 10.1021/nl103718a
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segregation of bimetallic alloys in nanoscale confinement; Applied
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nanostructured solid-acid fuel-cell electrodes via electrospray
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inverted single-digit nanometer domains in ferroelectric films;
Applied Physics Letters; Vol. 96; No. 2; 023103; 10.1063/1.3280371
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Study of Chemisorption of Oxygen and Aziridine on Graphitic
Nanostructures; Journal of Physical Chemistry C; Vol. 113; No. 33;
14721-14726; 10.1021/jp904555n
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aspect ratio silicon dioxide-coated single-walled carbon nanotube
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Chemical Reactions at High Collision Energies?; Journal of the
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Laboratory Breakthrough to Technological Realization: The Development
Path for Solid Acid Fuel Cells; Interface; Vol. 18; No. 3;
53-59
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as a wear-tolerant probe for ultrahigh density data storage; Applied
Physics Letters; Vol. 93; No. 10; Art. No. 103112; 10.1063/1.2981641
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carbon-oxygen reactive potential; Journal of Chemical Physics; Vol.
128; No. 23; Art. No. 234706; 10.1063/1.2940329
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Differential Mobility Analyzer for One Nanometer Particle
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angles, ordering, and solidification of liquid mercury in carbon
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excimer emission from pulsed high-pressure capillary
microdischarges; Applied Physics Letters; Vol. 90; No. 24; Art.
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Simultaneous Double-Electron Promotion in F+ Collisions with
Surfaces; Physical Review Letters; Vol. 97; No. 25; Art. No. 257603;
10.1103/PhysRevLett.97.257603
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Deformation Regime in Bending of Single-Walled Carbon Nanotubes;
Physical Review Letters; Vol. 97; No. 24; Art. No. 245501; 10.1103/PhysRevLett.97.245501
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Response of Single-Wall Carbon Nanotube Probes during Tapping Mode
Atomic Force Microscopy: Modeling and Experiment; Nano Letters; Vol.
6; No. 8; 1669-1673; 10.1021/nl060831o
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in Carbon Nanotubes; Science; Vol. 310; No. 5753; 1480-1483; 10.1126/science.1120385
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ion beamline scattering apparatus for surface science
investigations; Review of Scientific Instruments; Vol. 76; No. 8;
Art. No. 083302; 10.1063/1.1994987
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mechanisms at the threshold for inelasticity in Ne+ collisions with
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of Blue Luminescent Si Nanoparticles Using Atmospheric-Pressure
Microdischarges; Nano Letters; Vol. 5; No. 3; 537-541; 10.1021/nl0480060
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Scanning Probes from Fluorocarbon-Coated Single-Walled Carbon
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excimer emission from high-pressure microdischarges in metal
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micro-discharges in etching and deposition applications; Journal of
Physics D: Applied Physics; Vol. 36; No. 23; 2914-2921
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cathode sustained plasma microjets: Characterization and application to
diamond deposition; Journal of Applied Physics; Vol. 92; No. 5;
2406-2411; 10.1063/1.1497719
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etching of silicon using patterned microdischarges; Applied Physics
Letters; Vol. 79; No. 5; 593-595; 10.1063/1.1388867
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film conformality in charging damage during plasma-assisted interlevel
dielectric deposition; Journal of Vacuum Science and Technology B;
Vol. 17; No. 3; 999-1002; 10.1116/1.590683
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damage during residual metal overetching; Applied Physics Letters;
Vol. 74; No. 7; 932-934; 10.1063/1.365617
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influence of surface currents on pattern-dependent charging and
notching; Journal of Applied Physics; Vol. 84; No. 2; 683-689; 10.1063/1.368123
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charging damage during interlevel oxide deposition in high-density
plasmas; Journal of Applied Physics; Vol. 84; No. 1; 154-160; 10.1063/1.368012
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the Substrate on Pattern-Dependent Charging; Journal of the
Electrochemical Society; Vol. 144; No. 12; L320-L322; 10.1149/1.1838146
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tunneling currents reduce plasma-induced charging; Applied Physics
Letters; Vol. 71; No. 20; 2928-2930; 10.1063/1.120218
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effect in plasma-induced charging; Applied Physics Letters; Vol. 71;
No. 14; 1942-1944; 10.1063/1.119988
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of current transients through ultrathin gate oxides during plasma
etching; Applied Physics Letters; Vol. 71; No. 14; 1945-1947; 10.1063/1.119989
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Origin of Charging Damage during Etching of Antenna Structures;
Journal of the Electrochemical Society; Vol. 144; No. 10; L285-L287; 10.1149/1.1838011
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reduction in group 4mm photonic crystals; Physical Review B; Vol.
56; No. 12; 7313-7320; 10.1103/PhysRevB.56.7313
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irradiance of conductive sidewalls: A determining factor for
pattern-dependent charging; Journal of Vacuum Science and Technology
B; Vol. 15; No. 5; 1741-1746; 10.1116/1.589364
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link between electron shadowing and charging damage; Journal of
Vacuum Science and Technology B; Vol. 15; No. 5; 1839-1842; 10.1116/1.589336
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Charging in Plasmas: Electron Temperature Effects; Physical Review
Letters; Vol. 79; No. 5; 845-848; 10.1103/PhysRevLett.79.845
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charging in high-density plasmas; Journal of Applied Physics; Vol.
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influence of mask thickness on charging damage during overetching;
Journal of Applied Physics; Vol. 82; No. 2; 572-577; 10.1063/1.365617
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of multiple-feature effects in plasma etching; Applied Physics
Letters; Vol. 70; No. 18; 2377-2379; 10.1063/1.118878
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influence of electron temperature on pattern-dependent charging during
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origin of the notching effect during etching in uniform high density
plasmas; Journal of Vacuum Science and Technology B; Vol. 15; No. 1;
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Dynamics and Profile Evolution during Etching of Silicon; Physical
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Two-Dimensional Photonic Band Gaps; Physical Review Letters; Vol.
77; No. 14; 2949-2952; 10.1103/PhysRevLett.77.2949
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density effects in the modulation spectroscopy of strained and
lattice-matched InGaAs/InAlAs/InP high-electron-mobility transistor
structures; Journal of Applied Physics; Vol. 80; No. 6; 3484-3487;
10.1063/1.363219
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neutral beam etching; Journal of Vacuum Science and Technology A;
Vol. 13; No. 3; 959-965; 10.1116/1.579658
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velocity distributions in helicon wave plasmas: Magnetic field and
pressure effects; Journal of Vacuum Science and Technology B; Vol.
11; No. 6; 2046-2056; 10.1116/1.586541
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in situ monitoring of surface reactions during plasma passivation of
GaAs; Applied Physics Letters; Vol. 62; No. 24; 3156-3158; 10.1063/1.109113
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ion energy control in high density glow discharges: Measurement of
absolute metastable ion concentrations; Journal of Applied Physics;
Vol. 73; No. 11; 7188-7194; 10.1063/1.352391
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transitions in InxGa1-xAs/In0.52Al0.48As single quantum wells studied by
room-temperature modulation spectroscopy; Physical Review B; Vol.
47; No. 12; 7198-7207; 10.1103/PhysRevB.47.7198
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plasma passivation of GaAs in downstream microwave and radio-frequency
parallel plate plasma reactors; Journal of Vacuum Science and
Technology B; Vol. 11; No. 2; 195-205; 10.1116/1.586703
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dependence of interband transitions in
In_(0.53)Ga_(0.47)As/In_(0.52)Al_(0.48)As single quantum wells by
room‐temperature electrotransmittance; Journal of Applied Physics;
Vol. 72; No. 5; 1912-1917; 10.1063/1.351666
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image diffraction from submicron photoresist gratings; Journal of
Vacuum Science and Technology B; Vol. 10; No. 5; 2230-2233; 10.1116/1.586194
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light scattering in characterizing reactively ion etched profiles;
Journal of Vacuum Science and Technology A; Vol. 9; No. 3; 664-668; 10.1116/1.577386
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and macroscopic uniformity control in plasma etching; Applied
Physics Letters; Vol. 57; No. 10; 983-985; 10.1063/1.103532
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monitoring of low-temperature hydrogen plasma passivation of GaAs;
Journal of Applied Physics; Vol. 68; No. 2; 440-445; 10.1063/1.346813
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incorporation in ZnSe grown by metalorganic chemical vapor
deposition; Applied Physics Letters; Vol. 55; No. 5; 463-465; 10.1063/1.101853
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quality epitaxial ZnSe and the relationship between electron mobility
and photoluminescence characteristics; Applied Physics Letters; Vol.
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