<h1>Atwater, Harry</h1>
<h2>Patent from <a href="https://authors.library.caltech.edu">CaltechAUTHORS</a></h2>
<ul>
<li>Flagan, Richard C. and Atwater, Harry A., el al. (2004) <a href="https://resolver.caltech.edu/CaltechAUTHORS:20150909-170622621">Aerosol process for fabricating discontinuous floating gate microelectronic devices</a></li>
<li>Flagan, Richard C. and Boer, Elizabeth A., el al. (2003) <a href="https://resolver.caltech.edu/CaltechAUTHORS:20150909-170253333">Aerosol silicon nanoparticles for use in semiconductor device fabrication</a></li>
</ul>