@article{https://authors.library.caltech.edu/records/x0aak-j5s42,
    title = "Atomic layer etching of niobium nitride using sequential exposures of O₂ and H₂/SF₆ plasmas",
    journal = "Journal of Vacuum Science \& Technology A",
    year = "2025",
    url = "https://authors.library.caltech.edu/records/x0aak-j5s42",
    id = "record",
    issn = "0734-2101",
    doi = "10.1116/6.0004548",
    volume = "43"
}